The quartz wafer cleaning tank is a high-purity vessel engineered for use in semiconductor wet process stations, specifically designed for chemical cleaning, etching, and rinsing of silicon wafers. Constructed from corrosion-resistant fused quartz, the tank withstands aggressive acids such as HF, HCl, and H?SO?, while maintaining excellent structural integrity at elevated temperatures.

Its ultra-smooth inner surface minimizes particle adhesion and metal contamination, ensuring a clean processing environment essential for advanced node device fabrication. The tank's dimensional precision supports uniform chemical flow and optimized wafer immersion, improving cleaning efficiency and reducing defect rates.